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Photolithography vs Nanoimprint

The two tools at the MPaCT Lab in Flagstaff, Arizona, pattern resist. They do not do the same job. One exposes a mask with ultraviolet light. The other presses a stamp.

Start here: do you already have a chrome mask, or a stamp?

Decision table

Photolithography Nanoimprint lithography
Transfer UV through a photomask Mechanical imprint from a stamp
What you must bring Chrome mask, 2 × 2 in to 5 × 5 in A master or stamp that fits the chamber
Feature size About 0.5–1.0 µm About 40 nm to >100 µm, master dependent
Largest substrate 100 mm 120 mm or 210 mm chamber, option dependent
Alignment of a second layer Topside, specified better than 1.0 µm Not a production overlay system on this desktop tool
Instrument at MPaCT SUSS MJB4 NIL Technology CNI v3.0

Choose by the question

"I have a chrome mask for a 100 mm wafer." - MJB4.

"I have a stamp and need copies, including sub-100 nm features." - CNI.

"I only have a CAD file." - Neither. Board-scale maskless work is laser micromachining or conductive-ink printing.

"I need a second layer aligned to the first." - MJB4. Do not treat the CNI as a stepper.

Both tools are listed as expected rather than available on the equipment catalogue. Confirm live status before planning a run.

Frequently asked questions

Should I use photolithography or nanoimprint?

Use the SUSS MJB4 when you have a chrome photomask and need 0.5 to 1.0 micrometre features on a wafer up to 100 mm. Use the CNI v3.0 when you have a stamp to copy, including features the contact aligner cannot print. Neither writes from a CAD file with no master.

Can nanoimprint replace a mask aligner?

Not for a chrome-mask process at micron scale, and not for aligned multilayer lithography of the kind the MJB4 is built for. Nanoimprint copies topography. Photolithography exposes an image. They share a resist step and then diverge.

MPaCT Lab - Building 98E, South Engineering Lab
561 E Pine Knoll Dr, Flagstaff, AZ 86001
Phone: 928-523-2343 · Email: mpct.nano@nau.edu

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